Evaluation of the perfection of the Pd-InP Schottky interface from the energy viewpoint of hydrogen adsorbates

被引:25
作者
Chen, HI [1 ]
Chou, YI [1 ]
机构
[1] Natl Cheng Kung Univ, Dept Chem Engn, Tainan 70101, Taiwan
关键词
D O I
10.1088/0268-1242/19/1/006
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In general, two factors, i.e. the Schottky barrier height (Phi(Bn)) and the ideality factor (n) based on thermionic emission current-voltage (I-V) analysis, are used to evaluate the interfacial quality of Schottky diodes. In this paper, we propose an alternative method, different from the traditional I-V analysis, to evaluate the perfection of the Pd-InP Schottky interface. By introducing hydrogen adsorbates into the Pd-InP interface, it is found that the interfacial hydrogen energy state can reflect the perfection of the Pd-InP Schottky interface. The Pd/InP Schottky diode with a more perfect interface infers that the interfacial hydrogen adsorbates possess higher energy states. Compared with the thermal evaporated Pd-InP Schottky interface, the electroless plated diode exhibits superior I-V characteristics. Also, it demonstrates that hydrogen adsorbates at the electroless plated Pd-InP interface truly possess higher energy states, e.g., Gibbs energy (G) and enthalpy (H). Therefore, this proposed method can be used for evaluating the perfection of the Pd-InP Schottky interface. Also, the result is consistent with that obtained by traditional I-V analysis.
引用
收藏
页码:39 / 44
页数:6
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