Donor and acceptor concentrations in degenerate InN

被引:137
作者
Look, DC [1 ]
Lu, H
Schaff, WJ
Jasinski, J
Liliental-Weber, Z
机构
[1] Wright State Univ, Semicond Res Ctr, Dayton, OH 45435 USA
[2] USAF, Res Lab, Mat & Mfg Directorate, Wright Patterson AFB, OH 45433 USA
[3] Cornell Univ, Dept Elect & Comp Engn, Ithaca, NY 14853 USA
[4] Univ Calif Berkeley, Lawrence Berkeley Lab, Berkeley, CA 94720 USA
[5] Univ Warsaw, Inst Expt Phys, PL-00681 Warsaw, Poland
关键词
D O I
10.1063/1.1432742
中图分类号
O59 [应用物理学];
学科分类号
摘要
A formalism is presented to determine donor (N-D) and acceptor (N-A) concentrations in wurtzitic InN characterized by degenerate carrier concentration (n) and mobility (mu). The theory includes scattering not only by charged point defects and impurities, but also by charged threading dislocations, of concentration N-dis. For a 0.45-mum-thick InN layer grown on Al2O3 by molecular beam epitaxy, having N-dis=5x10(10) cm(-2), determined by transmission electron microscopy, n(20 K)=3.5x10(18) cm(-3) and mu(20 K)=1055 cm(2)/V s, determined by Hall effect measurements, the fitted values are N-D=4.7x10(18) cm(-3) and N-A=1.2x10(18) cm(-3). The identities of the donors and acceptors are not known, although a comparison of N-D with analytical data, and also with calculations of defect formation energies, suggests that a potential candidate for the dominant donor is H. (C) 2002 American Institute of Physics.
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页码:258 / 260
页数:3
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