Dislocation-independent mobility in lattice-mismatched epitaxy: application to GaN

被引:72
作者
Look, DC [1 ]
Stutz, CE
Molnar, RJ
Saarinen, K
Liliental-Weber, Z
机构
[1] Wright State Univ, Semicond Res Ctr, Dayton, OH 45435 USA
[2] USAF, Res Lab, Wright Patterson AFB, OH 45433 USA
[3] MIT, Lincoln Lab, Lexington, MA 02173 USA
[4] Helsinki Univ Technol, Phys Lab, FIN-02015 Helsinki, Finland
[5] Lawrence Berkeley Natl Lab, Div Mat Sci, Berkeley, CA 94720 USA
关键词
interfaces; epitaxy; dislocations;
D O I
10.1016/S0038-1098(01)00010-2
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
Lattice-mismatched epitaxy produces a high concentration of dislocations (N-dis) in the interface region, and this region is often highly conductive, due to donor (N-D) decoration of the dislocations. Here we show that a simple postulate, N-D = alpha (N-dis/c), where c is the lattice constant and alpha a constant of order 1-2, predicts a nearly constant low-temperature mobility, independent of N-dis This prediction is experimentally verified in GaN grown on Al2O3, and is also applied to other mismatched systems. (C) 2001 Elsevier Science Ltd. All rights reserved.
引用
收藏
页码:571 / 575
页数:5
相关论文
共 11 条
[1]   ELECTRONIC-PROPERTIES OF VAPOR-GROWN HETEROEPITAXIAL ZNO FILM ON SAPPHIRE [J].
KASUGA, M ;
OGAWA, S .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1983, 22 (05) :794-798
[2]   Defect donor and acceptor in GaN [J].
Look, DC ;
Reynolds, DC ;
Hemsky, JW ;
Sizelove, JR ;
Jones, RL ;
Molnar, RJ .
PHYSICAL REVIEW LETTERS, 1997, 79 (12) :2273-2276
[3]   Dislocation scattering in GaN [J].
Look, DC ;
Sizelove, JR .
PHYSICAL REVIEW LETTERS, 1999, 82 (06) :1237-1240
[4]  
MOLNAR RJ, 1995, MATER RES SOC SYMP P, V378, P479, DOI 10.1557/PROC-378-479
[5]   The role of dislocation scattering in n-type GaN films [J].
Ng, HM ;
Doppalapudi, D ;
Moustakas, TD ;
Weimann, NG ;
Eastman, LF .
APPLIED PHYSICS LETTERS, 1998, 73 (06) :821-823
[6]  
ORTON JW, 1999, GAN RELATED SEMICOND, P294
[7]   Observation of native Ga vacancies in GaN by positron annihilation [J].
Saarinen, K ;
Laine, T ;
Kuisma, S ;
Nissila, J ;
Hautojarvi, P ;
Dobrzynski, L ;
Baranowski, JM ;
Pakula, K ;
Stepniewski, R ;
Wojdak, M ;
Wysmolek, A ;
Suski, T ;
Leszczynski, M ;
Grzegory, I ;
Porowski, S .
PHYSICAL REVIEW LETTERS, 1997, 79 (16) :3030-3033
[8]   Photoelectrochemical capacitance-voltage measurements in GaN [J].
Stutz, CE ;
Mack, M ;
Bremser, MD ;
Nam, OH ;
Davis, RF ;
Look, DC .
JOURNAL OF ELECTRONIC MATERIALS, 1998, 27 (05) :L26-L28
[9]  
Yakimov EB, 1997, J PHYS III, V7, P2293, DOI 10.1051/jp3:1997102
[10]  
Yamamoto A, 1999, PHYS STATUS SOLIDI A, V176, P689, DOI 10.1002/(SICI)1521-396X(199911)176:1<689::AID-PSSA689>3.0.CO