Formation of nanocrystalline diamond by hydrocarbon plasma beam deposition

被引：14

作者：

Sattel, S

Robertson, J

Tass, Z

Scheib, M

Wiescher, D

Ehrhardt, H

机构：

[1] UNIV CAMBRIDGE,DEPT ELECT ENGN,CAMBRIDGE CB2 1PZ,ENGLAND

[2] TECH UNIV BUDAPEST,DEPT ATOM PHYS,H-1111 BUDAPEST,HUNGARY

[3] UNIV KAISERSLAUTERN,IFOS,D-67663 KAISERSLAUTERN,GERMANY

来源：

关键词：

diamond CVD; a-C:H; nucleation; ion beam growth;

D O I：

10.1016/S0925-9635(96)00648-6

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Diamond crystallites up to 40 nm in size have been grown from a highly ionised plasma beam of acetylene for ion energies close to 100 eV per C atom and substrate temperatures above 450 degrees C. This shows that diamond can be grown by physical vapour deposition from an ion-rich plasma as well as by chemical vapour deposition from a radical-rich plasma. The formation mechanism is argued to be one of nucleation and growth rather than a stress-induced transformation from graphite. (C) 1997 Elsevier Science S.A.

引用

页码：255 / 260

页数：6

共 31 条

[1] ION-BEAM DEPOSITION OF THIN FILMS OF DIAMONDLIKE CARBON [J].