First-principles calculations for charged states of hydrogen atoms in SiO2

被引:116
作者
Yokozawa, A [1 ]
Miyamoto, Y [1 ]
机构
[1] NEC CORP LTD,FUNDAMENTAL RES LABS,TSUKUBA,IBARAKI 305,JAPAN
来源
PHYSICAL REVIEW B | 1997年 / 55卷 / 20期
关键词
D O I
10.1103/PhysRevB.55.13783
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Charged states of H atoms in defect-free SiO2 have been proposed from first-principles total-energy bandstructure calculations within a framework of the local-density approximation. The polarities of the charged states are determined depending on the position of the Fermi level. A positively charged state forms an Si-(OH+)-Si complex, while a negatively charged state forms an Si-H- bond. Calculated vibrational frequencies of newly formed O-H+ and Si-H- bonds for each charge state are found to be lower than those for neutral O-H and Si-H bonds, so the H-originated charge traps are expected to be distinguishable by either Raman or infrared spectroscopies.
引用
收藏
页码:13783 / 13788
页数:6
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