Growth and characterization of OMVPE grown (In,Mn)As diluted magnetic semiconductor

被引:46
作者
Blattner, AJ [1 ]
Lensch, J
Wessels, BW
机构
[1] Northwestern Univ, Dept Mat Sci & Engn, Evanston, IL 60208 USA
[2] Northwestern Univ, Ctr Mat Res, Evanston, IL 60208 USA
基金
美国国家科学基金会;
关键词
spintronics; diluted magnetic semiconductors; indium manganese arsenide;
D O I
10.1007/s11664-001-0192-y
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In1-xMnxAs diluted magnetic semiconductor (DMS) thin films with x less than or equal to 0.14 have been grown using organometallic vapor phase epitaxy. Tricarbonyl(methyleyclopentadienyl)manganese was successfully used as the Mn source. Single phase, epitaxial films were achieved for compositions as high as x=0.14 using growth temperatures greater than or equal to 475 degreesC. For lower growth temperatures or x>0.14, nanometer scale MnAs precipitates were observed within the In1-xMnxAs matrix. Transport properties were investigated using the Hall effect. All Mn doped films were p-type with single phase films exhibiting hole concentrations less than or equal to 2 x 10(19) cm(-3). Magnetization was measured as a function of temperature and applied field for a single phase film with x=0.1. Ferromagnetic ordering was observed at 5 K with a saturation magnetization of M-s = 68 emu/cm(3), a remnant magnetization, M-r 10 emu/cm(3), and a coercive field H-c = 400 Oe.
引用
收藏
页码:1408 / 1411
页数:4
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