An x-ray standing-wave study of H2S adsorption on InP(110)

被引:15
作者
Dudzik, E
Leslie, A
OToole, E
McGovern, IT
Patchett, A
Zahn, DRT
Ludecke, J
Woodruff, DP
Cowie, BCC
机构
[1] TECH UNIV CHEMNITZ,FACHBEREICH PHYS,D-09126 CHEMNITZ,GERMANY
[2] UNIV WARWICK,DEPT PHYS,COVENTRY CV4 7AL,W MIDLANDS,ENGLAND
[3] DARESBURY LAB,WARRINGTON WA4 4AB,CHESHIRE,ENGLAND
关键词
D O I
10.1088/0953-8984/8/1/004
中图分类号
O469 [凝聚态物理学];
学科分类号
070205 ;
摘要
The sulphur adsorption site for H2S-dosed InP(110) has been determined using normal-incidence x-ray standing waves (NIXSW) using the (220), (022) and (113) Bragg planes for triangulation. Photoabsorption was monitored by photoelectron emission from the S 1s, P 1s and In 3d(5/2) core levels. The sulphur was found to be located in the phosphorus sites of the continued-layer structure, bonding to the surface indium. Using Auger electron emission for surface-sensitive NIXSW, it was found that H2S adsorption lifts the relaxation of the clean surface.
引用
收藏
页码:15 / 24
页数:10
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