Diamond film growth by pulse-modulated magnetoactive microwave plasma chemical vapour deposition

被引：3

作者：

Hatta, A

Suzuki, H

Kadota, K

Ito, T

Hiraki, A

机构：

[1] Department of Electrical Engineering, Osaka University

来源：

THIN SOLID FILMS | 1996年 / 281卷

关键词：

chemical vapour deposition; diamond; glow discharge optical spectroscopy; plasma processing and deposition;

D O I：

10.1016/0040-6090(96)08648-8

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Diamond films were deposited by pulse-modulated magnetoactive microwave plasma chemical vapour deposition. The dependence of the deposition rate on the modulation frequency showed a strong peak at 500 Hz. The deposition rate of the pulse-modulated plasma was several times larger than that of the continuous plasma at the same microwave power. The time-averaged methyl radical (CH3) density measured by infrared laser absorption spectroscopy was also enhanced by pulse modulation; however, the CH3 density was not always proportional to the resulting deposition rate.

引用

收藏

页码：264 / 266

页数：3

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