Quantum shift of band-edge stimulated emission in InGaN-GaN multiple quantum well light-emitting diodes

被引:85
作者
Sun, CJ
Anwar, MZ
Chen, Q
Yang, JW
Khan, MA
Shur, MS
Bykhovski, AD
LilientalWeber, Z
Kisielowski, C
Smith, M
Lin, JY
Xiang, HX
机构
[1] RENSSELAER POLYTECH INST, DEPT ELECT COMP & SYST ENGN, TROY, NY 12180 USA
[2] UNIV CALIF BERKELEY, LAWRENCE BERKELEY LAB, BERKELEY, CA 94720 USA
[3] UNIV VIRGINIA, DEPT ELECT ENGN, CHARLOTTESVILLE, VA 22903 USA
[4] UNIV CALIF BERKELEY, DEPT MAT SCI & MINERAL ENGN, BERKELEY, CA 94720 USA
[5] KANSAS STATE UNIV, DEPT PHYS, MANHATTAN, KS 66506 USA
关键词
D O I
10.1063/1.118762
中图分类号
O59 [应用物理学];
学科分类号
摘要
We report on the band-edge stimulated emission in InGaN-GaN multiple quantum well light-emitting diodes with varying widths and barrier thicknesses of the quantum wells. In these devices, we observe that the stimulated emission peak wavelength shifts to shorter values with decreasing well thickness. From the comparison of the results of the quantum mechanical calculations of the subbands energies with the measured data, we estimate the effective conduction- and valence-band discontinuities at the GaN-In0.13Ga0.87N heterointerface to be approximately 130-155 and 245-220 meV, respectively. We also discuss the effect of stress on the estimated values of band discontinuities. (C) 1997 American Institute of Physics.
引用
收藏
页码:2978 / 2980
页数:3
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