Sub-ft gain resonance of InP/InGaAs-HBTs

被引:7
作者
Rohner, M [1 ]
Willén, B [1 ]
Jäckel, H [1 ]
机构
[1] Swiss Fed Inst Technol, Swiss Fed Inst Technol, Elect Lab, CH-8092 Zurich, Switzerland
关键词
base-pushout; high-frequency limitations; hole velocity; InP-HBT; Kirk-effect; unilateral power gain;
D O I
10.1109/16.981209
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Advanced npn-InP/InGaAs HBTs are often operated at high current levels for optimum high-speed performance. Because of velocity modulation effects, these transistors may operate in base-pushout although measurements of the cut-off frequency f(t) indicate the opposite. We show that the low mobility of the holes has a strong effect on the transistor operation in this regime, which is only revealed from a dynamic analysis: The unilateral power gain peaks far below f(t) followed by a -40 dB/dec roll-off. The effect was thoroughly analyzed and as a result, we present a simple equivalent circuit model that successfully describes transistors operating in pushout up to very high frequencies.
引用
收藏
页码:213 / 220
页数:8
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