Computational studies on plasma generation and erosion in a rectangular magnetron sputtering system

被引：9

作者：

Ido, S

Nakamura, K

机构：

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1996年 / 35卷 / 4A期

关键词：

magnetron sputtering; electron orbit simulation; Monte Carlo method; rectangular magnet; plasma distribution; external magnetic fields;

D O I：

10.1143/JJAP.35.2302

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

A 5-dimensional simulation of electron orbits is applied to a planer magnetron sputtering system with rectangular magnets. Collisions between electrons and neutral gas atoms of Ar are considered and the ionization points are assumed to approximate the distribution of sputtering plasmas. The effect of external magnetic fields on the control of the shape of magnetic fields in this calculation model is examined. By applying the external magnetic fields, the distribution of plasma density as well as the position of erosion on the target can be controlled.

引用

页码：2302 / 2305

页数：4

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