Exposure of self-assembled monolayers to highly charged ions and metastable atoms

被引：26

作者：

Ratliff, LP

Minniti, R

Bard, A

Bell, EW ^{[1
]}

Gillaspy, JD

Parks, D

Black, AJ

Whitesides, GM

机构：

[1] Natl Inst Stand & Technol, Atom Phys Div, Gaithersburg, MD 20899 USA

[2] Harvard Univ, Dept Chem & Biol Chem, Cambridge, MA 02138 USA

来源：

APPLIED PHYSICS LETTERS | 1999年 / 75卷 / 04期

关键词：

D O I：

10.1063/1.124451

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

The doses of neutral metastable argon atoms (Ar*) and highly charged xenon ions (HCIs) required to damage self-assembled monolayers (SAMs) of alkanethiolates on gold are compared in a set of experiments carried out concurrently. The extent of damage to the SAM is determined by developing the samples in a gold etching solution, then measuring the decrease in reflectivity of the gold; approximate to 10(5) Ar* are required to cause the same amount of damage as 1 HCI, as measured by this assay. We have also demonstrated HCI micropatterning of a surface using a physical mask, suggesting the application of this system in lithography. (C) 1999 American Institute of Physics. [S0003-6951(99)03330-6].

引用

页码：590 / 592

页数：3

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