Optimal lithium targets for laser-plasma lithography

被引：12

作者：

Andreev, AA ^{[1
]}

Ueda, T ^{[1
]}

Limpouch, J ^{[1
]}

机构：

[1] Yokogawa Elect Corp, Tokyo 1808750, Japan

来源：

EMERGING LITHOGRAPHIC TECHNOLOGIES V | 2001年 / 4343卷

关键词：

soft x-ray source; laser-produced plasmas; debris reduction;

D O I：

10.1117/12.436706

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Lithium containing droplet and cluster targets irradiated by laser pulses are proposed as prospective source of for soft x-ray lithography. Analytical model and simulations show that laser with repetition rate of several MHz with energy of several mJ and pulse duration 10 ps is required.

引用

收藏

页码：789 / 796

页数：8

相关论文

共 14 条

[1] Ion acceleration in short-pulse laser-target interactions [J].

Andreev, AA ;

Limpouch, J .

JOURNAL OF PLASMA PHYSICS, 1999, 62 :179-193

[2] Optimal enhancement of x-ray line emission from plasma by shaping of short high intensity laser pulses [J].

Andreev, AA ;

Limpouch, J ;

Nakano, H .

COMMERCIAL AND BIOMEDICAL APPLICATIONS OF ULTRAFAST LASERS II, 2000, 3934 :52-60

[3]

ANDREEV AA, 2000, INT OPT C SKT PET RU

[4]

BERENBERG V, 2000, P SOC PHOTO-OPT INS, V4095, P939

[5] CONTINUUM RADIATION SOURCE OF HIGH INTENSITY [J].

BOGEN, P ;

CONRADS, H ;

GATTI, G ;

KOHLHAAS, W .

JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1968, 58 (02) :203-&

[6] Liquid-target laser-plasma sources for EUV and x-ray lithography [J].

Hertz, HM ;

Berglund, M ;

Hansson, BAM ;

Rymell, L .

EUV, X-RAY, AND NEUTRON OPTICS AND SOURCES, 1999, 3767 :2-9

[7] NEW LASER-PLASMA SOURCE FOR EXTREME-ULTRAVIOLET LITHOGRAPHY [J].

JIN, F ;

RICHARDSON, M .

APPLIED OPTICS, 1995, 34 (25) :5750-5760

[8] Intense plasma discharge source at 13.5 nm for extreme-ultraviolet lithography [J].

Klosner, MA ;

Bender, HA ;

Silfvast, WT ;

Rocca, JJ .

OPTICS LETTERS, 1997, 22 (01) :34-36

[9] High-power extreme ultraviolet source based on gas jets [J].

Kubiak, GD ;

Bernardez, LJ ;

Krenz, K .

EMERGING LITHOGRAPHIC TECHNOLOGIES II, 1998, 3331 :81-89

[10] A time-dependent model for plasma spectroscopy of K-shell emitters [J].

Lee, RW ;

Larsen, JT .

JOURNAL OF QUANTITATIVE SPECTROSCOPY & RADIATIVE TRANSFER, 1996, 56 (04) :535-556