Performance of the Raith 150 electron-beam lithography system

被引：27

作者：

Goodberlet, JG ^{[1
]}

Hastings, JT ^{[1
]}

Smith, HI ^{[1
]}

机构：

[1] MIT, Elect Res Lab, Cambridge, MA 02139 USA

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2001年 / 19卷 / 06期

关键词：

D O I：

10.1116/1.1414018

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

The performance of a Raith 150 electron-beam lithography system is reported. The system's resolution, stability, intrafield distortion, stitching, and overlay performance are evaluated. Patterning at low- and high-acceleration voltages is compared. The system was used to pattern sub-20 nm features, and the largest intrafield distortion for a 100 mum field was measured to be 15 nm. Pattern-placement accuracy below 35 nm, mean plus twice the standard deviation, was demonstrated. (C) 2001 American Vacuum Society.

引用

页码：2499 / 2503

页数：5

共 7 条

[1] METROLOGY OF ELECTRON-BEAM LITHOGRAPHY SYSTEMS USING HOLOGRAPHICALLY PRODUCED REFERENCE SAMPLES [J].

ANDERSON, EH ;

BOEGLI, V ;

SCHATTENBURG, ML ;

KERN, D ;

SMITH, HI .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1991, 9 (06) :3606-3611

[2] Analysis of distortion in interferometric lithography [J].

Ferrera, J ;

Schattenburg, ML ;

Smith, HI .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1996, 14 (06) :4009-4013

[3] Two-dimensional spatial-phase-locked electron-beam lithography via sparse sampling [J].

Hastings, JT ;

Zhang, F ;

Finlayson, MA ;

Goodberlet, JG ;

Smith, HI .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2000, 18 (06) :3268-3271

[4] Low voltage electron beam lithography in PMMA [J].

Olkhovets, A ;

Craighead, HG .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1999, 17 (04) :1366-1370

[5]

ORLOFF J, 1997, CHARGED PARTICLE OPT, P376

[6] Resist processes for low-energy electron-beam lithography [J].

Schock, KD ;

Prins, FE ;

Strahle, S ;

Kern, DP .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1997, 15 (06) :2323-2326

[7] A NEW APPROACH TO HIGH FIDELITY E-BEAM AND ION-BEAM LITHOGRAPHY BASED ON AN INSITU GLOBAL-FIDUCIAL GRID [J].

SMITH, HI ;

HECTOR, SD ;

SCHATTENBURG, ML ;

ANDERSON, EH .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1991, 9 (06) :2992-2995

← 1 →