Resist processes for low-energy electron-beam lithography

被引:24
作者
Schock, KD [1 ]
Prins, FE [1 ]
Strahle, S [1 ]
Kern, DP [1 ]
机构
[1] Univ Tubingen, Inst Angew Phys, D-72076 Tubingen, Germany
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1997年 / 15卷 / 06期
关键词
D O I
10.1116/1.589638
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Low-energy electron-beam lithography processes have been studied, a new resist system has been proposed, and preliminary tests have been performed. The interaction between electrons and e-beam resist and its effect on the exposure dose and the penetration depth of the electrons have been studied as a function of electron energy. A silylation process for low energy e-beam lithography has been tested and applied to a new bilayer resist scheme for low-energy electron-beam exposure. (C) 1997 American Vacuum Society.
引用
收藏
页码:2323 / 2326
页数:4
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