共 9 条
[1]
Bethe H, 1930, ANN PHYS-BERLIN, V5, P325
[2]
BLANCHARD CH, 1954, 527 NBS
[3]
SURFACE IMAGING BY SILYLATION FOR LOW-VOLTAGE ELECTRON-BEAM LITHOGRAPHY
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,
1994, 12 (06)
:3473-3477
[5]
RESISTS AND PROCESSES FOR 1 KV ELECTRON-BEAM MICROCOLUMN LITHOGRAPHY
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,
1995, 13 (03)
:812-820
[6]
Studies of 1 and 2 keV electron beam lithography using silicon containing P(SI-CMS) resist
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,
1995, 13 (06)
:2980-2985
[7]
LOW-VOLTAGE, HIGH-RESOLUTION STUDIES OF ELECTRON-BEAM RESIST EXPOSURE AND PROXIMITY EFFECT
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B,
1992, 10 (06)
:3083-3087
[9]
TANNEBAUM DM, 1996, J VAC SCI TECHNOL B, V14, P3829