Two-dimensional spatial-phase-locked electron-beam lithography via sparse sampling

被引：19

作者：

Hastings, JT ^{[1
]}

Zhang, F ^{[1
]}

Finlayson, MA ^{[1
]}

Goodberlet, JG ^{[1
]}

Smith, HI ^{[1
]}

机构：

[1] MIT, Dept Elect Engn & Comp Sci, Cambridge, MA 02139 USA

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2000年 / 18卷 / 06期

关键词：

Spatial-phase-locked electron beam lithography;

D O I：

10.1116/1.1314371

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

We report a new mode of spatial-phase-locked electron-beam lithography based on alignment of each e-beam deflection field to a fiducial grid on the substrate. Before exposing the pattern in a given field, the fiducial grid is sparsely sampled with the electron beam at a subexposure dose. These samples form a two-dimensional moire pattern that is analyzed to calculate field shift, scale, rotation, nonorthogonality, and trapezoidal distortion. Experimental verification of the approach was carried out with a scintillating fiducial grid quenched by interference lithography. Despite a Door signal-to-noise ratio, we achieved sub-beamstep field-stitching and pattern-placement accuracy. (C) 2000 American Vacuum Society. [S0734-211X(00)02206-X].

引用

页码：3268 / 3271

页数：4

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