Scintillating global-fiducial grid for electron-beam lithography

被引:12
作者
Goodberlet, J [1 ]
Carter, J [1 ]
Smith, HI [1 ]
机构
[1] MIT, Elect Res Lab, Cambridge, MA 02139 USA
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1998年 / 16卷 / 06期
关键词
D O I
10.1116/1.590389
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
An organic scintillator has been developed for use in electron-beam lithography. The scintillator can be deposited in a thin film (<200 nm) on the substrate, and can be patterned by an ultraviolet-interferometric exposure to produce a uniformly thick, scintillating, fiducial grid. When scanned with the electron beam, the scintillating pattern produces a high-contrast (>2) optical signal. It is expected that the signal from this type of-grid will improve the pattern-placement precision. to within 1 nm when used in conjunction with spatial-phase-locked electron-beam lithography. (C) 1998 American Vacuum Society. [S0734-211X(98)02106-4].
引用
收藏
页码:3672 / 3675
页数:4
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