Scintillating global-fiducial grid for electron-beam lithography

被引：12

作者：

Goodberlet, J ^{[1
]}

Carter, J ^{[1
]}

Smith, HI ^{[1
]}

机构：

[1] MIT, Elect Res Lab, Cambridge, MA 02139 USA

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1998年 / 16卷 / 06期

关键词：

D O I：

10.1116/1.590389

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

An organic scintillator has been developed for use in electron-beam lithography. The scintillator can be deposited in a thin film (<200 nm) on the substrate, and can be patterned by an ultraviolet-interferometric exposure to produce a uniformly thick, scintillating, fiducial grid. When scanned with the electron beam, the scintillating pattern produces a high-contrast (>2) optical signal. It is expected that the signal from this type of-grid will improve the pattern-placement precision. to within 1 nm when used in conjunction with spatial-phase-locked electron-beam lithography. (C) 1998 American Vacuum Society. [S0734-211X(98)02106-4].

引用

页码：3672 / 3675

页数：4

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