Selective epitaxial growth of graphene on SiC

被引:48
作者
Camara, N. [1 ]
Rius, G. [1 ]
Huntzinger, J. -R. [2 ]
Tiberj, A. [2 ]
Mestres, N. [3 ]
Godignon, P. [1 ]
Camassel, J. [2 ]
机构
[1] CSIC, IMB, CNM, Barcelona 08193, Spain
[2] Univ Montpellier 2, CNRS, GES, UMR 5650, F-34095 Montpellier 5, France
[3] CSIC, ICMAB, Barcelona 08193, Spain
关键词
D O I
10.1063/1.2988645
中图分类号
O59 [应用物理学];
学科分类号
摘要
We present a method of selective epitaxial growth of few layers graphene (FLG) on a "prepatterned" silicon carbide (SiC) substrate. The methods involves, successively, the sputtering of a thin aluminium nitride (AlN) layer on top of a monocrystalline SiC substrate and, then, patterning it with e-beam lithography and wet etching. The sublimation of few atomic layers of Si from the SiC substrate occurs only through the selectively etched AlN layer. The presence of the Raman G-band at similar to 1582 cm(-1) in the AlN-free areas is used to validate the concept. It gives absolute evidence of selective FLG growth. (C) 2008 American Institute of Physics.
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页数:3
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