Carrier relaxation and thermal activation of localized excitons in self-organized InAs multilayers grown on GaAs substrates

被引：259

作者：

Xu, ZY ^{[1
]}

Lu, ZD ^{[1
]}

Yang, XP ^{[1
]}

Yuan, ZL ^{[1
]}

Zheng, BZ ^{[1
]}

Xu, JZ ^{[1
]}

Ge, WK ^{[1
]}

Wang, Y ^{[1
]}

Wang, J ^{[1
]}

Chang, LL ^{[1
]}

机构：

[1] HONG KONG UNIV SCI & TECHNOL,DEPT PHYS,KOWLOON,HONG KONG

来源：

PHYSICAL REVIEW B | 1996年 / 54卷 / 16期

关键词：

D O I：

10.1103/PhysRevB.54.11528

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

We have investigated the temperature dependence of photoluminescence (PL) properties of a number of self-organized InAs/GaAs heterostructures with InAs layer thickness ranging from 0.5 to 3 ML. The temperature dependence of InAs exciton emission and linewidth was found to display a significant difference when the InAs layer thickness is smaller or larger than the critical thickness around 1.7 ML. The fast redshift of PL energy and an anomalous decrease of linewidth with increasing temperature were observed and attributed to the efficient relaxation process of carriers in multilayer samples, resulting from the spread and penetration of the carrier wave functions in coupled InAs quantum dots. The measured thermal activation energies of different samples demonstrated that the InAs wetting layer may act as a barrier for the thermionic emission of carriers in high-quality InAs multilayers, while in InAs monolayers and submonolayers the carriers are required to overcome the GaAs barrier to escape thermally from the localized states.

引用

页码：11528 / 11531

页数：4

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