A future of function or failure?

被引：15

作者：

Alam, M ^{[1
]}

Weir, B ^{[1
]}

Silverman, P ^{[1
]}

机构：

[1] Agere Syst, Murray Hill, NJ USA

来源：

IEEE CIRCUITS & DEVICES | 2002年 / 18卷 / 02期

关键词：

D O I：

10.1109/101.994857

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Transistors are scaled in each successive technology generation to increase circuit speed and to improve packing density. However, as the devices get smaller, ensuring their reliability becomes increasingly difficult. This paper outlines the technology reliable for the next ten years when it comes to scaling of gate oxides.

引用

页码：42 / 48

页数：7

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