Electrochemical deposition of ZnO film and its photoluminescence properties

被引:87
作者
Gao, YF [1 ]
Nagai, M
Masuda, Y
Sato, F
Koumoto, K
机构
[1] Nagoya Univ, Grad Sch Engn, Dept Mol Design & Engn, Nagoya, Aichi 4648603, Japan
[2] Musashi Inst Technol, Adv Res Labs, Tokyo 1580082, Japan
[3] Noritake Co Ltd, Aichi 4700293, Japan
关键词
band gap; morphology; photoluminescence; electrochemical deposition; ZnO;
D O I
10.1016/j.jcrysgro.2005.10.072
中图分类号
O7 [晶体学];
学科分类号
0702 ; 070205 ; 0703 ; 080501 ;
摘要
ZnO thin films were prepared by the electrochemical deposition method on conductive substrates. The as-deposited film was ZnO crystallites of the wurzite structure highly oriented along the (0 0 2) plane. The specific crystalline morphology may be attributed to the growth mechanism through the orientation attachment mode, which is one of the characteristics peculiar for the present process, because the terrace has been clearly observed in high-resolution AFM images. The film shows high transmittance and an optical band gap energy of 3.3 eV. After annealing in N-2 or Ar, strong green emission was observed, which should be related to the generation of singly ionized oxygen defects. Improving emission intensity further by optimizing the annealing conditions, this method may be promising to replace the traditional method for preparation of ZnO green phosphor. (c) 2005 Elsevier B.V. All rights reserved.
引用
收藏
页码:445 / 450
页数:6
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