Biaxial strain effect in exciton resonance energies of epitaxial ZnO layers grown on 6H-SiC substrates

被引:8
作者
Ashrafi, A. B. M. A. [1 ]
Zhang, B. -P. [1 ]
Binh, N. T. [1 ]
Wakatsuki, K. [1 ]
Segawa, Y. [1 ]
机构
[1] Inst Phys & Chem Res, Lab Photophys, Photodynam Res Ctr, Sendai, Miyagi 9800845, Japan
关键词
Biaxial stress; Critical thickness; Free excitons; Oxide semiconductors;
D O I
10.1016/j.jcrysgro.2004.11.356
中图分类号
O7 [晶体学];
学科分类号
0702 [物理学]; 070205 [凝聚态物理]; 0703 [化学]; 080501 [材料物理与化学];
摘要
Thickness-dependent biaxial strain relaxation of epitaxial ZnO layers grown on 6H-SiC substrates has been addressed. The strain ratio under the biaxial stress was estimated to be 0.38, while the c/a ratio changed from 1.593 to 1.608. The biaxial strain was accounted maximum for the ZnO layer thickness of >= 6->= 200 nm. Free (FXA), donor-bound ((DX)-X-0), and neutral acceptor-bound (A(0)X) excitons energies were blue shifted with the increase of layer thickness to be 2.5, 4.8, and 5.8 meV, respectively. The strain-induced band shift for the FXA, FXB, and (DX)-X-0 bands was estimated with the corresponding energies of 13.1, 16.4, and 14.6 eV. The strain-induced optical band structure was analyzed using the Hamiltonian for the valence bands under the out-of-plane biaxial strain. (C) 2004 Published by Elsevier B.V.
引用
收藏
页码:E2439 / E2443
页数:5
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