Highly Versatile and Robust Materials for Soft Imprint Lithography Based on Thiol-ene Click Chemistry

被引：223

作者：

Campos, Luis M. ^{[1
,2
]}

Meinel, Ines ^{[3
]}

Guino, Rosette G. ^{[1
,2
]}

Schierhorn, Martin ^{[1
,2
]}

Gupta, Nalini ^{[1
,2
]}

Stucky, Galen D. ^{[1
,2
]}

Hawker, Craig J. ^{[1
,2
]}

机构：

[1] Mat Res Lab, Mitsubishi Chem Ctr Adv Mat, Santa Barbara, CA 93111 USA

[2] Univ Calif Santa Barbara, Santa Barbara, CA 93111 USA

[3] MC Res & Innovat Ctr, Goleta, CA 93117 USA

来源：

ADVANCED MATERIALS | 2008年 / 20卷 / 19期

关键词：

D O I：

10.1002/adma.200800330

中图分类号：

O6 [化学];

学科分类号：

0703 [化学];

摘要：

As easy as "shake and bake", the mixing and photocuring of poly-functional thiols with alkene-functional cross-linkers, via thiol-ene click chemistry, leads to materials with outstanding and tunable characteristics for soft imprint lithography. The materials are cured within 2 minutes at ambient conditions allowing stamps with high aspect ratio and sub-100nm features to be fabricated.

引用

页码：3728 / +

页数：7

共 29 条

[1]

Combined microscale mechanical topography and chemical patterns on polymer cell culture substrates [J].

Charest, JL ;

Eliason, MT ;

García, AJ ;

King, WP .

BIOMATERIALS, 2006, 27 (11) :2487-2494

[2]

A photocurable poly(dimethylsiloxane) chemistry designed for soft lithographic molding and printing in the nanometer regime [J].

Choi, KM ;

Rogers, JA .

JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 2003, 125 (14) :4060-4061

[3]

An ultraviolet-curable mold for sub-100-nm lithography [J].

Choi, SJ ;

Yoo, PJ ;

Baek, SJ ;

Kim, TW ;

Lee, HH .

JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 2004, 126 (25) :7744-7745

[4]

Imprint lithography with 25-nanometer resolution [J].

Chou, SY ;

Krauss, PR ;

Renstrom, PJ .

SCIENCE, 1996, 272 (5258) :85-87

[5]

Self-supporting hydrogel stamps for the microcontact printing of proteins [J].

Coq, Nais ;

van Bommel, Ties ;

Hikmet, Rifat A. ;

Stapert, Hendrik R. ;

Dittmer, Wendy U. .

LANGMUIR, 2007, 23 (09) :5154-5160

[6]

New approaches to nanofabrication: Molding, printing, and other techniques [J].

Gates, BD ;

Xu, QB ;

Stewart, M ;

Ryan, D ;

Willson, CG ;

Whitesides, GM .

CHEMICAL REVIEWS, 2005, 105 (04) :1171-1196

[7]

Replication of vertical features smaller than 2 nm by soft lithography [J].

Gates, BD ;

Whitesides, GM .

JOURNAL OF THE AMERICAN CHEMICAL SOCIETY, 2003, 125 (49) :14986-14987

[8]

Nanostructuring titania by embossing with polymer molds made from anodic alumina templates [J].

Goh, C ;

Coakley, KM ;

McGehee, MD .

NANO LETTERS, 2005, 5 (08) :1545-1549

[9]

Effects of modulus and surface chemistry of thiol-ene photopolymers in nanoimprinting [J].

Hagberg, Erik C. ;

Malkoch, Michael ;

Ling, Yibo ;

Hawker, Craig J. ;

Carter, Kenneth R. .

NANO LETTERS, 2007, 7 (02) :233-237

[10]

Thiol-enes: Chemistry of the past with promise for the future [J].

Hoyle, CE ;

Lee, TY ;

Roper, T .

JOURNAL OF POLYMER SCIENCE PART A-POLYMER CHEMISTRY, 2004, 42 (21) :5301-5338

← 1 2 3 →