Development of tungsten coating for fusion applications

被引：43

作者：

Cambe, A

Gauthier, E ^{[1
]}

Layet, JM

Bentivegna, S

机构：

[1] Ctr Etud Cadarache, EURATOM Assoc, CEA, Dept Rech Fus Controlee, F-13108 St Paul Les Durance, France

[2] Univ Aix Marseille 1, Ctr Univ St Jerome, PIIM UMR 6633, CNRS, F-13397 Marseille 20, France

[3] MPA Ind ZA Est du Puits de la Chaux, F-42651 St Jean Bonnefonds 1, France

来源：

FUSION ENGINEERING AND DESIGN | 2001年 / 56-57卷

关键词：

Plasma Facing Component (PFC); high-Z; tungsten; Plasma Assisted Chemical Vapor Deposition (PACVD);

D O I：

10.1016/S0920-3796(01)00350-7

中图分类号：

TL [原子能技术]; O571 [原子核物理学];

学科分类号：

0827 ; 082701 ;

摘要：

Recent developments in fusion have led to reconsider the use of high-Z material as Plasma Facing Component (PFC). Tungsten is presently a good candidate according to its high energy threshold for physical sputtering and its lack of sensitivity to chemical sputtering. We present here a new deposition process of Tungsten. based on Plasma Assisted Chemical Vapor Deposition (PACVD). This process has been used to deposit tungsten and rhenium on several substrates. The analyses of the coating properties have shown good adhesion on graphite, stainless-steel and copper. A study has been done to apply this process to cover the plasma facing components in Tore-Supra (C) 2001 Published by Elsevier Science B.V.

引用

页码：331 / 336

页数：6

共 15 条

[1] SELECTIVE LOW-PRESSURE CHEMICAL VAPOR-DEPOSITION OF TUNGSTEN [J].