INFLUENCE OF LOW-ENERGY ELECTRON-IRRADIATION ON THE ADHESION OF GOLD-FILMS ON A SILICON SUBSTRATE

被引：18

作者：

DALLAPORTA, H

CROS, A

机构：

来源：

APPLIED PHYSICS LETTERS | 1986年 / 48卷 / 20期

关键词：

D O I：

10.1063/1.96908

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：1357 / 1359

页数：3

共 12 条

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