Piezoelectric fields in nitride devices

被引:25
作者
Beach, RA [1 ]
McGill, TC [1 ]
机构
[1] CALTECH, Thomas J Watson Sr Labs Appl Phys, Pasadena, CA 91125 USA
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1999年 / 17卷 / 04期
关键词
D O I
10.1116/1.590820
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We have calculated the piezoelectric field and charge distribution for various III-nitride heterostructures. Our calculations include strain energy minimization and doping effects, and are presented to show the magnitude of piezoelectric effects in strained layers. We compare our calculated results to device results where available. These include the two-dimensional electron gas in heterojunction field effect transistors, Schottky diodes with strained layers for Schottky height engineering, and III-nitride single quantum wells. Calculations that included energy considerations resulted in good agreement between predicted and observed field and charge distributions for the heterojunction fields-effect transistors structure. (C) 1999 American Vacuum Society. [S0734-211X(99)07104-8].
引用
收藏
页码:1753 / 1756
页数:4
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