Electrical resistivity, MNM transition and band-gap narrowing of cubic GaN:Si

被引:6
作者
Araújo, CM
Fernandez, JRL
da Silva, AF
Pepe, I
Leite, JR
Sernelius, BE
Tabata, A
Persson, C
Ahuja, R
As, DJ
Schikora, D
Lischka, K
机构
[1] Univ Fed Bahia, Inst Fis, BR-40210340 Salvador, BA, Brazil
[2] Univ Sao Paulo, Inst Fis, BR-05315970 Sao Paulo, Brazil
[3] Linkoping Univ, Dept Phys & Measurement Technol, SE-58183 Linkoping, Sweden
[4] Uppsala Univ, Dept Phys, SE-75121 Uppsala, Sweden
[5] Univ Paderborn, Phys FB 6, D-33095 Paderborn, Germany
关键词
resistivity; metal-nonmetal transition; band-gap shift; photoluminescence;
D O I
10.1016/S0026-2692(01)00133-1
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The electrical resistivity of the Si-donor cubic GaN is investigated theoretically at low temperature. The critical impurity concentration, N-c, for the metal-nonmetal transition is estimated in three different ways: from using the generalized Drude approach (GDA) for the resistivity; from the vanishing of the chemical potential calculated using the dielectric function model with a Lorentz-Lorenz correction; from finding the crossing point between the energy in the insulating and metallic states. The bandgap narrowing (BGN) has been determined theoretically and experimentally above the MNM transition, The experimental data have been obtained with photoluminescence measurements. Theoretical and experimental results are in rough agreement in the range of impurity concentration of interest. (C) 2002 Elsevier Science Ltd. All rights reserved.
引用
收藏
页码:365 / 369
页数:5
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