Characterization of self-patterned SrBi2Ta2O9 thin films from photo-sensitive solutions

被引：15

作者：

Uchida, H ^{[1
]}

Soyama, N ^{[1
]}

Kageyama, K ^{[1
]}

Ogi, K ^{[1
]}

Scott, MC ^{[1
]}

Cuchiaro, JD ^{[1
]}

Derbenwick, GF ^{[1
]}

Mcmillan, LD ^{[1
]}

DeAraujo, CAP ^{[1
]}

机构：

[1] SYMETRIX CORP,COLORADO SPRINGS,CO 80918

来源：

INTEGRATED FERROELECTRICS | 1997年 / 16卷 / 1-4期

关键词：

D O I：

10.1080/10584589708013028

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

Self-patterned SrBi2Ta2O9 thin films were successfully fabricated from photo-sensitive solutions by means of UV irradiation through photo masks. After conventional baking and wet etching the films were annealed. The photo-sensitive SrBi2Ta2O9 solutions give high resolution negative-pattern of the mask image down to 1 mu m line width by deep UV irradiation at 900 mJ/cm(2). The capacitor characteristics of the 210 nm thick films fabricated on the Pt/Ti/SiO2/Si substrates by this process showed 2Pr values of 17 mu C/cm(2), 2Ec of 89 kV/cm, and leakage current densities of 5x10(9) A/cm(2) at 5 V. The films showed no fatigue after 1x10(11) switching cycles.

引用

页码：41 / 52

页数：12

共 9 条

[1] PREPARATION OF BI-BASED FERROELECTRIC THIN-FILMS BY SOL-GEL METHOD [J].

ATSUKI, T ;

SOYAMA, N ;

YONEZAWA, T ;

OGI, K .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1995, 34 (9B) :5096-5099

[2] FATIGUE-FREE FERROELECTRIC CAPACITORS WITH PLATINUM-ELECTRODES [J].

DEARAUJO, CAP ;

CUCHIARO, JD ;

MCMILLAN, LD ;

SCOTT, MC ;

SCOTT, JF .

NATURE, 1995, 374 (6523) :627-629

[3] THE DEGRADATION OF FERROELECTRIC PROPERTIES OF PZT THIN-FILMS DUE TO PLASMA DAMAGE [J].

ISHIHARA, K ;

ISHIKAWA, T ;

HAMADA, K ;

ONISHI, S ;

KUDO, J ;

SAKIYAMA, K .

INTEGRATED FERROELECTRICS, 1995, 6 (1-4) :301-307

[4] CHARACTERISTICS OF BISMUTH LAYERED SRBI2TA2O9 THIN-FILM CAPACITORS AND COMPARISON WITH PB(ZR,TI)O-3 [J].

MIHARA, T ;

YOSHIMORI, H ;

WATANABE, H ;

DEARAUJO, CAP .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1995, 34 (9B) :5233-5239

[5]

MOZAMI R, 1994, S VLSI TECH, P55

[6]

NAKAO Y, 1995, P 1995 INT S APPL FE, P450

[7] PREPARATION OF DIELECTRIC THIN-FILMS FROM PHOTOSENSITIVE SOL-GEL SOLUTION [J].

SOYAMA, N ;

SASAKI, G ;

ATSUKI, T ;

YONEZAWA, T ;

OGI, K .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 1994, 33 (9B) :5268-5271

[8]

SOYAMA N, 1995, P 1995 INT S APPL FE, P408

[9] PREPARATION OF FERROELECTRIC THIN-FILMS OF BISMUTH LAYER STRUCTURED COMPOUNDS [J].

WATANABE, H ;

MIHARA, T ;

YOSHIMORI, H ;

DEARAUJO, CAP .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1995, 34 (9B) :5240-5244

← 1 →