Magnetoresistance of atomic-scale electromigrated nickel nanocontacts

被引：35

作者：

Keane, ZK ^{[1
]}

Yu, LH ^{[1
]}

Natelson, D ^{[1
]}

机构：

[1] Rice Univ, Dept Phys & Astron, Houston, TX 77005 USA

来源：

APPLIED PHYSICS LETTERS | 2006年 / 88卷 / 06期

基金：

美国国家科学基金会;

关键词：

D O I：

10.1063/1.2172232

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We report measurements of the electron transport through atomic-scale constrictions and tunnel junctions between ferromagnetic electrodes. Structures are fabricated using a combination of e-beam lithography and controlled electromigration. Sample geometries are chosen to allow independent control of electrode bulk magnetizations. As junction size is decreased to the single channel limit, conventional anisotropic magnetoresistance (AMR) increases in magnitude, approaching the size expected for tunneling magnetoresistance (TMR) upon tunnel junction formation. Significant mesoscopic variations are seen in the magnitude and sign of the magnetoresistance, and no evidence is found of large ballistic magnetoresistance effects. (c) 2006 American Institute of Physics.

引用

页数：3

共 15 条

[1]

BOLOTIN KI, 2005, CONDMAT0510410

[2] Artifacts in ballistic magnetoresistance measurements (invited) [J].