The preparation of a phosphorus doped silicon film from phosphorus containing silicon nanoparticles

被引：40

作者：

Baldwin, RK ^{[1
]}

Zou, J ^{[1
]}

Pettigrew, KA ^{[1
]}

Yeagle, GJ ^{[1
]}

Britt, RD ^{[1
]}

Kauzlarich, SM ^{[1
]}

机构：

[1] Univ Calif Davis, Dept Chem, Davis, CA 95616 USA

来源：

CHEMICAL COMMUNICATIONS | 2006年 / 06期

关键词：

D O I：

10.1039/b513330k

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Phosphorus containing and octyl-terminated silicon nanoparticles (NPs) are generated by a solution reduction route under room temperature conditions for the first time and characterized by TEM, HRTEM, EDX, H-1/C-13/P-31 NMR, EPR, and PL spectroscopy, then annealed to form a thin film with phosphorus doping confirmed by microprobe elemental analyses.

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收藏

页码：658 / 660

页数：3

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