Importance of many-body effects in the clustering of charged Zn dopant atoms in GaAs

被引:43
作者
Ebert, P
Zhang, TJ
Kluge, F
Simon, M
Zhang, ZY
Urban, K
机构
[1] Forschungszentrum Julich, Inst Festkorperforsch, D-52425 Julich, Germany
[2] Univ Tennessee, Dept Phys, Knoxville, TN 37996 USA
[3] Oak Ridge Natl Lab, Div Solid State, Oak Ridge, TN 37831 USA
关键词
D O I
10.1103/PhysRevLett.83.757
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
The spatial distribution of negatively charged Zn dopant atoms in GaAs has been investigated by cross-sectional scanning tunneling microscopy. At high densities, the dopant atoms exhibit clear clustering behavior, suggesting the existence of an effective attractive interaction in addition to the screened Coulomb repulsion between two dopants. By analyzing the data through Monte Carlo simulations, we have extracted the intrinsic screening length at different dopant densities and attributed the origin of the effective attraction to strong many-body effects in the dopant-dopant repulsion.
引用
收藏
页码:757 / 760
页数:4
相关论文
共 16 条
[11]   DIRECT IMAGING OF DOPANTS IN GAAS WITH CROSS-SECTIONAL SCANNING-TUNNELING-MICROSCOPY [J].
JOHNSON, MB ;
ALBREKTSEN, O ;
FEENSTRA, RM ;
SALEMINK, HWM .
APPLIED PHYSICS LETTERS, 1993, 63 (21) :2923-2925
[12]   GEOMETRY AND ELECTRONIC-STRUCTURE OF THE ARSENIC VACANCY ON GAAS(110) [J].
LENGEL, G ;
WILKINS, R ;
BROWN, G ;
WEIMER, M ;
GRYKO, J ;
ALLEN, RE .
PHYSICAL REVIEW LETTERS, 1994, 72 (06) :836-839
[13]   LATTICE SUPERDILATION PHENOMENA IN DOPED GAAS [J].
MULLIN, JB ;
STRAUGHAN, BW ;
DRISCOLL, CMH ;
WILLOUGHBY, AFW .
JOURNAL OF APPLIED PHYSICS, 1976, 47 (06) :2584-2587
[14]   LOCAL STATE DENSITY AND LONG-RANGE SCREENING OF ADSORBED OXYGEN-ATOMS ON THE GAAS(110) SURFACE [J].
STROSCIO, JA ;
FEENSTRA, RM ;
FEIN, AP .
PHYSICAL REVIEW LETTERS, 1987, 58 (16) :1668-1671
[15]   FIELD-ION MICROSCOPE OBSERVATIONS OF INDIRECT INTERACTION BETWEEN ADATOMS ON METAL-SURFACES [J].
TSONG, TT .
PHYSICAL REVIEW LETTERS, 1973, 31 (19) :1207-1210
[16]   DIFFUSION MECHANISM OF ZINC AND BERYLLIUM IN GALLIUM-ARSENIDE [J].
YU, S ;
TAN, TY ;
GOSELE, U .
JOURNAL OF APPLIED PHYSICS, 1991, 69 (06) :3547-3565