Characterisation of cobalt/copper multilayers obtained by electrodeposition

被引：28

作者：

Gómez, E

Labarta, A

Llorente, A

Vallés, E

机构：

[1] Univ Barcelona, Fac Quim, Dept Quim Fis, LCTEM, E-08028 Barcelona, Spain

[2] Univ Barcelona, Fac Fis, Dept Fis Fonamental, E-08028 Barcelona, Spain

来源：

SURFACE & COATINGS TECHNOLOGY | 2002年 / 153卷 / 2-3期

关键词：

plating; multilayer; scanning electron microscopy; X-ray diffraction; cobalt-copper; giant magnetoresistance;

D O I：

10.1016/S0257-8972(01)01698-X

中图分类号：

TB3 [工程材料学];

学科分类号：

0805 ; 080502 ;

摘要：

Electrodeposition of Co/Cu compositionally modulated multilayers was studied, using a single bath under potentiostatic conditions. The structure of the multilayers was characterised by scanning electron microscopy (SEM) and X-ray diffraction (XRD). Co/Cu multilayers with different sublayer thickness can be produced from a single bath as a function of different pulse potentials and deposition charges, avoiding cobalt oxidation at the start of each copper deposition. Copper sublayers are constituted of pure copper whereas `cobalt' sublayers contain a low copper percentage (less than or equal to2%). The multilayered Co/Cu depasits exhibit giant magnetaresistance when the thickness of the bilayers is approximately a few nanometers. (C) 2002 Elsevier Science B.V. All rights reserved.

引用

页码：261 / 266

页数：6

共 25 条

[1] Microstructure of Ni-Cu multilayers electrodeposited from a citrate electrolyte [J].