Recent progress in soft lithography

被引：408

作者：

Rogers, John A. ^{[1
]}

Nuzzo, Ralph G.

机构：

[1] Univ Illinois, Beckman Inst, Dept Mat Sci & Engn, Urbana, IL 61801 USA

来源：

MATERIALS TODAY | 2005年 / 8卷 / 02期

基金：

美国国家科学基金会;

关键词：

D O I：

10.1016/S1369-7021(05)00702-9

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The future of nanoscience and nanotechnology depends critically on techniques for micro- and nanofabrication. An emerging set of methods, known collectively as soft lithography, uses elastomeric stamps, molds, and conformable photomasks for patterning two- and three-dimensional structures with minimum feature sizes deep into the nanometer regime. The powerful patterning capabilities of these techniques together with their experimental simplicity make them useful for a wide range of applications. This article reviews recent progress in the field of soft lithography, with a focus on trends in research and steps toward commercialization.

引用

页码：50 / 56

页数：7

共 38 条

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