Immersion zone-plate-array lithography

被引：25

作者：

Chao, D ^{[1
]}

Patel, A ^{[1
]}

Barwicz, T ^{[1
]}

Smith, HI ^{[1
]}

Menon, R ^{[1
]}

机构：

[1] MIT, Elect Res Lab, Cambridge, MA 02139 USA

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2005年 / 23卷 / 06期

关键词：

D O I：

10.1116/1.2127942

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

An immersion scheme is used to improve resolution, exposure latitude, and depth-of-focus in zone-plate-array lithography (ZPAL). We believe this is the first implementation of an immersion scheme in a maskless lithography system. Replacing air with de-ionized water as the medium between the zone-plate array and the substrate effectively increases the system's numerical aperture and consequently, enhances its patterning capabilities. The design and fabrication process of an immersion zone plate is described. Its behavior is then characterized through the experimental reconstruction of its point-spread function, and compared to the theoretical model. A wide variety of patterns were printed, demonstrating the improved lithographic performance of immersion ZPAL. (c) 2005 American Vacuum Society.

引用

页码：2657 / 2661

页数：5

共 14 条

[11]

MENON R, UNPUB P SPIE

[12] Sub-0.1 μ electron-beam lithography for nanostructure development [J].