Recent progress in high resolution lithography

被引：220

作者：

Bratton, D ^{[1
]}

Yang, D ^{[1
]}

Dai, JY ^{[1
]}

Ober, CK ^{[1
]}

机构：

[1] Cornell Univ, Ithaca, NY 14853 USA

来源：

POLYMERS FOR ADVANCED TECHNOLOGIES | 2006年 / 17卷 / 02期

关键词：

lithography; extreme ultraviolet (EUV); molecular glass; block copolymers; nanotechnology;

D O I：

10.1002/pat.662

中图分类号：

O63 [高分子化学（高聚物）];

学科分类号：

070305 ; 080501 ; 081704 ;

摘要：

The nanotechnology revolution of the past decade owes much to the science of lithography, an umbrella term which encompasses everything from conventional photolithography to "unconventional" soft lithography and the self-assembly of block polymers. In this review, some of the recent advances in lithography are summarized with special reference to the microelectronics industry. The next generation photolithography, two-photon lithography, step-and-flash imprint lithography and nanofabrication using block copolymers are covered, in an attempt to describe more recent work in this vibrant and active field of research. Copyright (c) 2006 John Wiley & Sons, Ltd.

引用

页码：94 / 103

页数：10

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