Surface characterization of smooth heteroepitaxial diamond layers on beta-SiC (001)

被引:7
作者
Mizuochi, Y [1 ]
Nagasawa, H [1 ]
Kawarada, H [1 ]
机构
[1] HOYA CORP,R&D CTR,AKISHIMA,TOKYO 196,JAPAN
关键词
crystal growth; heteroepitaxy; atomic force microscopy; surface;
D O I
10.1016/S0925-9635(96)00710-8
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Surface morphology of continuous heteroepitaxial diamond layers on beta-SiC (001) has been characterized by various methods. From surface normal SEM images, the surface was so smooth that crystal boundaries were not clearly observed, but in AFM and Normarski optical microscope images, shallow gaps supposed to be remnant boundaries and wrinkles on the surfaces were observed. On the other hand, isolated (001) surfaces before coalescence had no wrinkles and were smoother than the surface of continuous heteroepitaxial films. The wrinkles observed only on the continuous heteroepitaxial film are considered to be formed by strain caused by coalescence, and raise the new problem of heteroepitaxy when the degree of orientation is improved. (C) 1997 Elsevier Science S.A.
引用
收藏
页码:277 / 281
页数:5
相关论文
共 11 条
[1]   EPITAXIAL DIAMOND THIN-FILMS ON (001) SILICON SUBSTRATES [J].
JIANG, X ;
KLAGES, CP ;
ZACHAI, R ;
HARTWEG, M ;
FUSSER, HJ .
APPLIED PHYSICS LETTERS, 1993, 62 (26) :3438-3440
[2]   DIAMOND SYNTHESIS FROM GAS-PHASE IN MICROWAVE PLASMA [J].
KAMO, M ;
SATO, Y ;
MATSUMOTO, S ;
SETAKA, N .
JOURNAL OF CRYSTAL GROWTH, 1983, 62 (03) :642-644
[3]   HETEROEPITAXIAL GROWTH OF SMOOTH AND CONTINUOUS DIAMOND THIN FILMS ON SILICON SUBSTRATES VIA HIGH-QUALITY SILICON-CARBIDE BUFFER LAYERS [J].
KAWARADA, H ;
SUESADA, T ;
NAGASAWA, H .
APPLIED PHYSICS LETTERS, 1995, 66 (05) :583-585
[4]   ORIENTED NUCLEATION AND GROWTH OF DIAMOND FILMS ON BETA-SIC AND SI [J].
KOHL, R ;
WILD, C ;
HERRES, N ;
KOIDL, P ;
STONER, BR ;
GLASS, JT .
APPLIED PHYSICS LETTERS, 1993, 63 (13) :1792-1794
[5]   HETEROEPITAXIAL GROWTH AND ESR EVALUATION OF 3C-SIC [J].
NAGASAWA, H ;
YAMAGUCHI, Y ;
IZUMI, T ;
TONOSAKI, K .
APPLIED SURFACE SCIENCE, 1993, 70-1 :542-545
[6]  
NAGASAWA H, 1994, I PHYS C SER, V137, P71
[7]   TEXTURED DIAMOND GROWTH ON (100) BETA-SIC VIA MICROWAVE PLASMA CHEMICAL VAPOR-DEPOSITION [J].
STONER, BR ;
GLASS, JT .
APPLIED PHYSICS LETTERS, 1992, 60 (06) :698-700
[8]   INITIAL GROWTH OF HETEROEPITAXIAL DIAMOND ON SI(001) SUBSTRATES VIA BETA-SIC BUFFER LAYER [J].
SUESADA, T ;
NAKAMURA, N ;
NAGASAWA, H ;
KAWARADA, H .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 1995, 34 (9A) :4898-4904
[9]   CHEMICAL-VAPOR-DEPOSITION AND CHARACTERIZATION OF SMOOTH (100)-FACETED DIAMOND FILMS [J].
WILD, C ;
KOIDL, P ;
MULLERSEBERT, W ;
WALCHER, H ;
KOHL, R ;
HERRES, N ;
LOCHER, R ;
SAMLENSKI, R ;
BRENN, R .
DIAMOND AND RELATED MATERIALS, 1993, 2 (2-4) :158-168
[10]   TEXTURED GROWTH OF DIAMOND ON SILICON VIA INSITU CARBURIZATION AND BIAS-ENHANCED NUCLEATION [J].
WOLTER, SD ;
STONER, BR ;
GLASS, JT ;
ELLIS, PJ ;
BUHAENKO, DS ;
JENKINS, CE ;
SOUTHWORTH, P .
APPLIED PHYSICS LETTERS, 1993, 62 (11) :1215-1217