Al2O3 nanotubes fabricated by wet etching of ZnO/Al2O3 core/shell nanofibers

被引：120

作者：

Hwang, J

Min, BD

Lee, JS

Keem, K

Cho, K

Sung, MY

Lee, MS

Kim, S ^{[1
]}

机构：

[1] Korea Univ, Dept Elect Engn, Seoul 136701, South Korea

[2] Samsung Elect Co Ltd, Semicond R&D Div, Proc Dev Team, Yongin, Kyunggi, South Korea

来源：

ADVANCED MATERIALS | 2004年 / 16卷 / 05期

关键词：

D O I：

10.1002/adma.200305209

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

In nanotube-based electronics, Al2O3 nanotubes will play a very important role. A method is reported that yields nanotubes with controllable, uniform wall thickness. The Figure represents the stage of the synthesis in which ZnO nanowires synthesized on a thick polycrystalline ZnO layer on a Si substrate have been coated with Al2O3 and the ZnO partially etched away. When the etching is complete, Al2O3 nanotubes remain.

引用

页码：422 / +

页数：5

共 14 条

[1] ZnO/Al2O3 nanolaminates fabricated by atomic layer deposition:: growth and surface roughness measurements [J].

Elam, JW ;

Sechrist, ZA ;

George, SM .

THIN SOLID FILMS, 2002, 414 (01) :43-55

[2] High-resolution depth profiling in ultrathin Al2O3 films on Si [J].

Gusev, EP ;

Copel, M ;

Cartier, E ;

Baumvol, IJR ;

Krug, C ;

Gribelyuk, MA .

APPLIED PHYSICS LETTERS, 2000, 76 (02) :176-178

[3] Atomic layer deposition of Al2O3 thin films using trimethylaluminum and isopropyl alcohol [J].

Jeon, WS ;

Yang, S ;

Lee, CS ;

Kang, SW .

JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 2002, 149 (06) :C306-C310

[4] Growth and characterization of aluminum oxide films by plasma-assisted atomic layer deposition [J].

Jeong, CW ;

Lee, BI ;

Joo, SK .

MATERIALS SCIENCE & ENGINEERING C-BIOMIMETIC AND SUPRAMOLECULAR SYSTEMS, 2001, 16 (1-2) :59-64

[5] Substrate dependence on the optical properties of Al2O3 films grown by atomic layer deposition [J].

Kim, Y ;

Lee, SM ;

Park, CS ;

Lee, SI ;

Lee, MY .

APPLIED PHYSICS LETTERS, 1997, 71 (25) :3604-3606

[6] Structural and optical properties of ZnO nanowires synthesized from ball-milled ZnO powders [J].

Park, K ;

Lee, JS ;

Sung, MY ;

Kim, S .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2002, 41 (12) :7317-7321

[7]

Pu L, 2001, ANGEW CHEM INT EDIT, V40, P1490, DOI 10.1002/1521-3773(20010417)40:8<1490::AID-ANIE1490>3.0.CO

[8]

2-K

[9] Monitoring of atomic layer deposition by incremental dielectric reflection [J].

Rosental, A ;

Adamson, P ;

Gerst, A ;

Niilisk, A .

APPLIED SURFACE SCIENCE, 1996, 107 :178-183

[10] Epitaxial growth of TiO2 films in a hydroxyl-free atomic layer deposition process [J].

Schuisky, M ;

Kukli, K ;

Aarik, J ;

Lu, J ;

Hårsta, A .

JOURNAL OF CRYSTAL GROWTH, 2002, 235 (1-4) :293-299

← 1 2 →