Electrical properties of ZrO2 thin films

被引:49
作者
Jonsson, AK [1 ]
Niklasson, GA [1 ]
Veszelei, M [1 ]
机构
[1] Uppsala Univ, Angstrom Lab, Dept Mat Sci, SE-75121 Uppsala, Sweden
关键词
conductivity; dielectric properties; zirconium;
D O I
10.1016/S0040-6090(01)01715-1
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Electrical properties of sputtered ZrO2 thin films have been studied using impedance spectroscopy, isothermal transient ionic current and current-voltage measurements. ZrO2 have different dielectric properties when fresh, i.e. newly deposited, or aged. A fresh sample can arbitrarily show two different behaviors consisting of a d.c. conductivity with a relaxation peak superimposed on it. The d.c. conductivity shows either of two different values. The aged sample has a lower d.c. conductivity and the relaxation peak is found at much lower frequencies. Fresh samples of ZrO2, also show switching behavior which aged samples never do. Analyses of current-voltage characteristics indicate hopping as the main conduction process. (C) 2002 Elsevier Science B.V All rights reserved.
引用
收藏
页码:242 / 247
页数:6
相关论文
共 23 条
[1]   FORMING PROCESS, IV CHARACTERISTICS AND SWITCHING IN GOLD ISLAND FILMS [J].
BLESSING, R ;
PAGNIA, H .
THIN SOLID FILMS, 1978, 52 (03) :333-341
[2]   ELECTRICAL PHENOMENA IN AMORPHOUS OXIDE FILMS [J].
DEARNALEY, G ;
STONEHAM, AM ;
MORGAN, DV .
REPORTS ON PROGRESS IN PHYSICS, 1970, 33 (11) :1129-+
[3]  
Dearnaley G., 1970, Journal of Non-Crystalline Solids, V4, P593, DOI 10.1016/0022-3093(70)90097-9
[4]   CONDUCTING FILAMENTS AND VOLTAGE-CONTROLLED NEGATIVE-RESISTANCE IN AL-AL2-O3-AU STRUCTURES WITH AMORPHOUS DIELECTRIC [J].
EMMER, I .
THIN SOLID FILMS, 1974, 20 (01) :43-52
[5]   Thermodynamic modelling of MOCVD of ZrO2 from beta-diketonates and different oxygen sources [J].
Fredriksson, E ;
Forsgren, K .
SURFACE & COATINGS TECHNOLOGY, 1997, 88 (1-3) :255-263
[6]   CURRENT VOLTAGE CHARACTERISTICS OF ELECTROFORMED DISCONTINUOUS FILMS OBSERVED IN HIGH-VACUUM [J].
GENGENBACH, T ;
PAGNIA, H ;
SOTNIK, N .
MATERIALS LETTERS, 1987, 5 (5-6) :215-217
[7]  
Granqvist C. G., 1995, HDB INORGANIC ELECTR
[8]   HIGH-RATE REACTIVE SPUTTER DEPOSITION OF ZIRCONIUM DIOXIDE [J].
JONES, F .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1988, 6 (06) :3088-3097
[9]   Li intercalation in zirconium dioxide films [J].
Jonsson, AK ;
Mattsson, MS ;
Niklasson, GA .
DEFECTS AND DIFFUSION IN CERAMICS: AN ANNUAL RETROSPECTIVE II, 2000, 177-1 :51-58
[10]   Dielectric study of thin films of Ta2O5 and ZrO2 [J].
Jonsson, AK ;
Frenning, G ;
Nilsson, M ;
Mattsson, MS ;
Niklasson, GA .
IEEE TRANSACTIONS ON DIELECTRICS AND ELECTRICAL INSULATION, 2001, 8 (04) :648-651