Progress in the measurement of lattice spacing d(220) of silicon

被引：45

作者：

Nakayama, K

Fujimoto, H

机构：

[1] National Research Laboratory of Metrology, Tsukuba City

来源：

IEEE TRANSACTIONS ON INSTRUMENTATION AND MEASUREMENT | 1997年 / 46卷 / 02期

关键词：

avogadro constant; lattice spacing; silicon; X-ray interferometer; XRCD method;

D O I：

10.1109/19.571922

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

X-ray and optical interferometry is applied to the measurement of silicon lattice spacing, The previously reported standard deviation 0.16 x 10(-6) has been reduced to 0.05 x 10(-6). The d(220) is 192 015.593(0.01) fm after correction of lattice strain by carbon and oxygen.

引用

页码：580 / 583

页数：4

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