Electromigration resistance of sputtered silver lines using different patterning techniques

Electromigration was investigated for sputtered Ag lines patterned by wet etching or by a novel hybrid etching technique. This new patterning technique works in two steps. After employing an oxygen plasma in the first step, a hydrogen peroxide solution is used in the second step. This technique shows an almost anisotropic etching behavior in contrast to the investigated wet etching techniques. The hybrid etched patterns were found to have an increased lifetime with up to about a threefold value in comparison to the best wet etched Ag lines. (C) 2002 Elsevier Science B.V. All rights reserved.