Microstructures and mechanical properties of chromium oxide films by arc ion plating

被引:64
作者
Ji, AL
Wang, W
Song, GH
Wang, QM
Sun, C
Wen, LS
机构
[1] Chinese Acad Sci, Inst Med Res, Dept Surface Engn Mat, Shenyang 110016, Peoples R China
[2] Chinese Acad Sci, Inst Med Res, Shenyang Natl Lab Mat Sci, Shenyang 110016, Peoples R China
[3] Shenyang Univ Technol, Shenyang 110023, Peoples R China
关键词
Cr2O3; films; arc ion plating; microstructure; mechanical properties;
D O I
10.1016/j.matlet.2003.12.029
中图分类号
T [工业技术];
学科分类号
08 [工学];
摘要
Chromium oxide (Cr2O3) films were deposited on stainless steel substrate by arc ion plating (AIP) technique. The results show that the flow rate of oxygen and bias voltage affected the microstructure, surface morphology and chemical composition of Cr2O3 films. The hardness of stoichiometric Cr2O3 film obtained at flow oxygen rate of 130 sccm and a bias voltage of -200 V reaches a maximum value of 36 GPa, much higher than that of films obtained by other deposition methods. (C) 2004 Elsevier B.V. All rights reserved.
引用
收藏
页码:1993 / 1998
页数:6
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