Comprehensive study on the properties of multilayered amorphous carbon films

被引:36
作者
Logothetidis, S [1 ]
Charitidis, C
Gioti, M
Panayiotatos, Y
Handrea, M
Kautek, W
机构
[1] Aristotelian Univ Salonika, Dept Phys, GR-54006 Salonika, Greece
[2] Fed Inst Mat Res & Testing, Lab Thin Film Technol, D-12205 Berlin, Germany
关键词
amorphous carbon; mechanical properties; photoelectron spectroscopy; sputtering;
D O I
10.1016/S0925-9635(99)00289-7
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Amorphous carbon (a-C) multilayered films consisting of sequential layers rich in sp(2) (A) and sp(3) (B) content have been developed by magnetron sputtering. We study here the effect of thickness d of the A layer in developing stable thick films with controllable stress and elastic properties. In situ spectroscopic ellipsometry is used to calculate the thickness and the composition of the individual lavers. The latter were compared with those obtained by depth profiling X-ray photoelectron spectroscopy, which also provides the different chemical bonding of the multilayers in depth. The stress and hardness of the deposited a-C films were found to be related to the thickness of the A(j) layers and the relative ratio d(Aj)/d(B) of thicknesses. The possible mechanisms for the stress control, stability and enhancement of elastic properties of multilayered a-C films are discussed. (C) 2000 Elsevier Science S.A. All rights reserved.
引用
收藏
页码:756 / 760
页数:5
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