Test-wave measurements of microwave absorption efficiency in a planar surface-wave plasma reactor

被引:12
作者
Ghanashev, I
Morita, S
Toyoda, N
Nagatsu, M
Sugai, H
机构
[1] Nagoya Univ, Dept Elect Engn, Chikusa Ku, Nagoya, Aichi 4648603, Japan
[2] Nissin Inc, Takarazuka, Hyogo 6650047, Japan
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1999年 / 38卷 / 7B期
关键词
surface-wave plasma; ICP; slot antenna; surface-wave excitation; power reflection coefficient;
D O I
10.1143/JJAP.38.4313
中图分类号
O59 [应用物理学];
学科分类号
摘要
A major obstacle for experimental surface-wave (SW) excitation and propagation studies in SW plasma is the self-consistent behaviour of the latter, which does not permit continuous variation of the electron density n(e). In the present study, we demonstrate how this obstacle can be overcome by an independent plasma source, in our case, an inductively coupled plasma (ICP) created by a high-power RF (13.56 MHz) generator. Through a rectangular waveguide short-circuited at its end by a movable plunger, we introduced into the ICP a weak (power less than 20 W) nonionising 2.4 GHz microwave. This permitted us to highlight important SW excitation and propagation phenomena. In particular, we confirmed the existence of the predicted [Jpn. J. Appl. Phys. 36 (1997) 4704] resonance minima in the n(e) dependence of the power reflection coefficient. The influence of the plunger position on the chamber matching was studied systematically and four different coupling aperture geometries were compared.
引用
收藏
页码:4313 / 4320
页数:8
相关论文
共 34 条
[21]  
MOISAN M, 1995, PHENOMENA IONIZED GA, P25
[22]   Optical emission and microwave field intensity measurements in surface wave-excited planar plasma [J].
Nagatsu, M ;
Xu, G ;
Yamage, M ;
Kanoh, M ;
Sugai, H .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1996, 35 (3A) :L341-L344
[23]  
NAGATSU M, 1998, 4 INT C REACT PLASM, P45
[24]   Characteristics of the planar plasma source sustained by microwave power [J].
Odrobina, I ;
Kudela, J ;
Kando, M .
PLASMA SOURCES SCIENCE & TECHNOLOGY, 1998, 7 (02) :238-243
[25]   PLASMA OSCILLATION METHOD FOR MEASUREMENTS OF ABSOLUTE ELECTRON-DENSITY IN PLASMA [J].
SHIRAKAWA, T ;
SUGAI, H .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1993, 32 (11A) :5129-5135
[26]  
STEPANOV KN, 1965, ZH TEKH FIZ, V35, P1002
[27]   High-density flat plasma production based on surface waves [J].
Sugai, H ;
Ghanashev, I ;
Nagatsu, M .
PLASMA SOURCES SCIENCE & TECHNOLOGY, 1998, 7 (02) :192-205
[28]   New-type microwave plasma source excited by azimuthally symmetric surface waves with magnetic multicusp fields [J].
Tuda, M ;
Ono, K .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1998, 16 (05) :2832-2839
[29]   Computer-aided design of microwave plasma sources: Potential and applications [J].
Walter, M ;
Korzec, D ;
Hutten, M ;
Engemann, J .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1997, 36 (7B) :4777-4783
[30]   Slot antenna 2.45 GHz microwave plasma source [J].
Werner, F. ;
Korzec, D. ;
Engemann, J. .
PLASMA SOURCES SCIENCE & TECHNOLOGY, 1994, 3 (04) :473-481