15-nm base type-II InP/GaAsSb/InP DHBTs with FT=384 GHz and a 6-V BVCEO

被引:29
作者
Liu, HG [1 ]
Watkins, SP
Bolognesi, CR
机构
[1] Simon Fraser Univ, Sch Engn Sci, Burnaby, BC V5A 1S6, Canada
[2] Simon Fraser Univ, Dept Phys, Burnaby, BC V5A 1S6, Canada
基金
加拿大自然科学与工程研究理事会;
关键词
breakdown voltage (BV); cutoff frequencies; double heterojunction bipolar transistors (DHBTs); GaAsSb; GaInAs; heterojunction bipolar transistors (HBTs); InP;
D O I
10.1109/TED.2005.863542
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Type-II InP/GaAsSb/InP double heterojunction bipolar transistors (DHBTs) with a 15-nm base were fabricated by contact lithography: 0.73 X 11 mu m(2) emitter devices feature f(T) = 384 GHz (f(MAX) = 262 GHz) and BVCEO = 6 V. This is the highest f(T) ever reported for InP/GaAsSb DHBTs, and an "all-technology" record f(T) X BVCEO product of 2304 GHz.V. This result is credited to the favorable scaling of InP/GaAsSb/InP DHBT breakdown voltages (BVCEO) in thin collector structures.
引用
收藏
页码:559 / 561
页数:3
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