Temperature dependence of Raman scattering in single crystal GaN films

被引:143
作者
Liu, MS [1 ]
Bursill, LA
Prawer, S
Nugent, KW
Tong, YZ
Zhang, GY
机构
[1] Univ Melbourne, Sch Phys, Parkville, Vic 3052, Australia
[2] Peking Univ, Dept Phys, Beijing 1000871, Peoples R China
[3] Peking Univ, Inst Wide Bandgap Mat & Devices, Beijing 1000871, Peoples R China
关键词
D O I
10.1063/1.124083
中图分类号
O59 [应用物理学];
学科分类号
摘要
Micro-Raman scattering from single crystal GaN films, both free-standing and attached to Al2O3 substrates, was performed over the temperature range from 78 to 800 K. These measurements reveal that the Raman phonon frequency decreases and the linewidth broadens with increasing temperature. This temperature dependence is well described by an empirical relationship which has proved to be effective for other semiconductors. The experiments also demonstrate that the strain from Al2O3 substrates compresses the epitaxial GaN in the c-axis direction. (C) 1999 American Institute of Physics. [S0003-6951(99)00521-5].
引用
收藏
页码:3125 / 3127
页数:3
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