Molecular beam epitaxial growth of P-ZnSe:N using a novel plasma source

被引:1
作者
Kimura, K
Miwa, S
Yasuda, T
Kuo, LH
Ohtake, A
Jin, CG
Tanaka, K
Yao, T
机构
[1] ANGSTROM TECHNOL PARTNERSHIP,TSUKUBA,IBARAKI 305,JAPAN
[2] NATL INST ADV INTERDISCIPLINARY RES,TSUKUBA,IBARAKI 305,JAPAN
[3] UNIV TSUKUBA,TSUKUBA,IBARAKI 305,JAPAN
[4] TOHOKU UNIV,INST MAT RES,AOBA KU,SENDAI,MIYAGI 980,JAPAN
关键词
molecular beam epitaxy (MBE); nitrogen doping; plasma source; ZnSe;
D O I
10.1007/s11664-997-0219-0
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We have studied the p-type doping in ZnSe molecular beam epitaxial growth using a novel high-power (5 kW) radio frequency (rf) plasma source. The effect of growth conditions such as the rf power, the Se/Zn flux ratio and the growth temperature on p-ZnSe:N was investigated,The net acceptor concentration (N-A - N-D) of around 1 x 10(18) cm(-3) was reproducibly achieved. The activation ratio ((N-A - N-D)/[N]) of p-ZnSe:N with N-A - N-D of 1.2 x 10(18) cm(-3) was found to be as high as 60%, which is the highest value so far obtained for N-A - N-D similar to 10(18) cm(-3). The 4.2K photoluminescence spectra of p-ZnSe:N grown under the optimized growth condition showed well-resolved deep donor-acceptor pair emissions even with high N-A - N-D.
引用
收藏
页码:705 / 709
页数:5
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