The LPCVD of rutile at low temperatures

被引：14

作者：

Hitchman, ML

Zhao, J

机构：

[1] Univ Strathclyde, Dept Pure & Appl Chem, Glasgow G1 1XL, Lanark, Scotland

[2] Univ Ulster, NIBEC, Newtownabbey BT37 0QB, Antrim, North Ireland

来源：

JOURNAL DE PHYSIQUE IV | 1999年 / 9卷 / P8期

关键词：

D O I：

10.1051/jp4:1999844

中图分类号：

O4 [物理学];

学科分类号：

0702 ;

摘要：

The crystalline structures of titanium dioxide (TiO2) thin films deposited on various substrates by LPCVD for temperatures <322 degrees C using titanium tetrabutoxide (TTB) have been studied. It has been found that the structures are dependent on the deposition temperature. XRD and Raman scattering show that amorphous TiO2 is formed below 215 degrees C, anatase between 235 degrees C-257 degrees C, a mixture of anatase and rutile at ca 270 degrees C, mainly rutile between 279 degrees C similar to 290 degrees C, and pure rutile above 300 degrees C.

引用

页码：357 / 364

页数：8

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