In situ resonant x-ray study of vertical correlation and capping effects during GaN/AlN quantum dot growth

被引:24
作者
Coraux, J
Renevier, H
Favre-Nicolin, V
Renaud, G
Daudin, B
机构
[1] CEA, SP2M, DRFMC, F-38054 Grenoble 9, France
[2] Univ Grenoble 1, F-38041 Grenoble, France
关键词
D O I
10.1063/1.2192572
中图分类号
O59 [应用物理学];
学科分类号
摘要
Grazing incidence anomalous x-ray scattering was used to monitor in situ the molecular beam epitaxy growth of GaN/AlN quantum dots (QDs). The strain state was studied by means of grazing incidence multiwavelength anomalous diffraction (MAD) in both the QDs and the AlN during the progressive coverage of QDs by AlN monolayers. Vertical correlation in the position of the GaN QDs was also studied by both grazing incidence MAD and anomalous grazing incidence small angle scattering as a function of the number of GaN planes and of the AlN spacer thickness. In a regime where the GaN QDs and the AlN capping are mutually strain influenced, a vertical correlation in the position of QDs is found with as a side effect an average increase in the QD width.
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页数:3
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