Electrical characterizations of resistive random access memory devices based on GaV4S8 thin layers

被引:18
作者
Tranchant, J. [1 ]
Janod, E. [1 ]
Cario, L. [1 ]
Corraze, B. [1 ]
Souchier, E. [1 ]
Leclercq, J. -L. [2 ]
Cremillieu, P. [2 ]
Moreau, P. [1 ]
Besland, M. -P. [1 ]
机构
[1] Univ Nantes, Inst Mat Jean Rouxel IMN, CNRS, F-44322 Nantes 3, France
[2] Univ Lyon, INL, Ecole Cent Lyon, CNRS,UMR 5270, F-69134 Ecully, France
关键词
Resistive switching; Non-volatile memory; Chalcogenide; Mott insulator; Sulfide; Correlated electron; Lacunar spinel; MIM structure; POSSIBLE SUPERCONDUCTIVITY;
D O I
10.1016/j.tsf.2012.10.104
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The Mott insulator compound GaV4S8 exhibits resistive switching (RS) properties under electric pulses which could be used in the domain of data storage for future replacement of Flash technology. In this work, we present the characterization and the resistive switching performances of three devices containing GaV4S8 thin films with various electrode sizes and geometries, i.e. planar interdigit electrodes and Metal/Insulator/Metal Au/GaV4S8/Au structures. First, we evidence the good quality of the interfaces between GaV4S8 layers and gold electrodes through transmission electron microscopy observations which allows reliable electrical characterizations. Then, we demonstrate a downscaling effect as the resistive switching amplitude Delta R/R= (R-high-R-low)/R-low increases from a few percents to more than 600% as the electrode size decreases from 50x50 mu m(2) to 2x2 mu m(2). Finally we show that other performances such as cycling endurance, reaching more than 65,000 RS cycles, data retention time till 10 years or writing speed below 100 ns confirm the high potential of GaV4S8 as active material in future resistive random access memories or Mott memories. (C) 2012 Elsevier B.V. All rights reserved.
引用
收藏
页码:61 / 65
页数:5
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