Heteroepitaxy of HgCdTe(112) infrared detector structures on Si(112) substrates by molecular-beam epitaxy

High-quality, single-crystal epitaxial films of CdTe(112)B and HgCdTe(112)B have been grown directly on Si(112) substrates without the need for GaAs interfacial layers. The CdTe and HgCdTe films have been characterized with optical microscopy, x-ray diffraction, wet chemical defect etching, and secondary ion mass spectrometry. HgCdTe/Si infrared detectors have also been fabricated and tested. The CdTe(112)B films are highly specular, twin-free, and have x-ray rocking curves as narrow as 72 are-sec and near-surface etch pit density (EPD) of 2 x 10(6) cm(-2) for 8 mu m thick films. HgCdTe(112)B films deposited on Si substrates have x-ray rocking curve FWHM I as low as 76 are-sec and EPD of 3-22 x 10(6) cm(-2). These MBE-grown epitaxial structures have been used to fabricate the first high-performance HgCdTe IR detectors grown directly on Si without use of an intermediate GaAs buffer layer. HgCdTe/Si infrared detectors have been fabricated with 40% quantum efficiency and R(0)A = 1.64 x 10(4) Omega-cm(2) (0 FOV) for devices with 7.8 mu m cutoff wavelength at 78K to demonstrate the capability of MBE for growth of large-area HgCdTe arrays on Si.